Inside 45nm Hi-k Silicon Innovation – Intel Chip Chat – Episode 7
August 27th, 2007 |
Connected Social Media Syndication
![Image for FaceBook](https://media7.connectedsocialmedia.com/intel/08/PID_2407/Podtech_Intel_ChipChat_107.jpg)
45nm Program Manager Kaizad Mistry takes you inside the groundbreaking 45nm Hi-k metal gate process technology used in the next generation of Intel Core microarchitecture.
Related stories: Intel, IntelMooresLaw
Posted in:
Connected Social Media, Corporate, Intel, Intel Chip Chat, Intel Developer Forum, Intel Moore's Law